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Comparison ledger

FPA 5500 iZa i-LineversusSF 130

Canon FPA 5500 iZa i-Line, Nikon SF 130, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Lithography, null[1]
Side-by-side comparison of selected equipment models
Attribute
SF 130Nikon
OEMCanonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 5500Nikon SF 130
Specifications
ConfigurationWide-Field[1]With:[3]
Machine typeStepper[1]—
Exposure sourcei-line[2]—
Wafer size8 inch[1]—
Field configurationWide-field[2]—
ManufacturerCanon[1]Nikon[3]
Operating System—Windows[3]
Model—SF 130[3]
Category—Lithography[4]
Light Source—i-line mercury lamp (365 nm wavelength)[5]
Exposure Wavelength—365 nm[6]
Max Wafer Size—200 mm[6]
Numerical Aperture—~0.50[6]
Throughput—about 100 wafers per hour[6]
Common Process Node—≥ 0.25 μm[6]
Tool type—lithography stepper[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]fab-spares.comfab-spares.com
  6. [6]waferpedia.comwaferpedia.com