Comparison ledger
Brooks 017-0024-01 Prealigner, Nikon S 306 C, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | S 306 CNikon |
|---|---|---|
| OEM | Brooks | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2002 orders accepted |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | Nikon S 306 C |
| Specifications | ||
| Arf Wavelength | — | 193 nm[1] |
| Configuration | — | Resolution ≤ 100 nm[2] |
| Reduction magnification 1 | — | 4[2] |
| Resolution | — | ≤ 100 nm (with SHRINC)[2] |
| Resolution (without SHRINC) | — | 120 nm[3] |
| Numerical Aperture (NA) | — | 0.78[2] |
| Exposure source | — | ArF excimer laser (193 nm)[2] |
| Reduction magnification | — | 1:4[2] |
| Maximum exposure range | — | 25 × 33 mm[2] |
| Overlap accuracy (EGA, |M| + 3σ) | — | ≤ 20 nm[2] |
| Alignment accuracy (three-sigma) | — | better than 23 nm[3] |
| Throughput | — | 135 – 200 wafers per hour (200 mm) / over 85 wafers per hour (300 mm)[3] |
| Wafer size | — | 8 inch (200 mm) and 300 mm[1] |
| Type | — | Scanner[1] |
| Make | — | Nikon[1] |
| Model | — | S 306 C[1] |
| NA | — | 0.78[2] |
| Alignment accuracy | — | better than 23 nm[3] |
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