Comparison ledger
ASM E 2000 Epitaxial Reactor, SPTS MVD300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MVD300SPTS | |
|---|---|---|
| OEM | ASM | SPTS |
| Category | Deposition | Deposition |
| Wafer size | 200mm | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASM E 2000 Epitaxial Reactor | SPTS MVD300 |
| Cited variants |
| |
| Specifications | ||
| Supply Voltage/ Freq | 480/ 50[4] | — |
| System Hand | Left Hand[4] | — |
| Monitor Type | Flat Panel[4] | — |
| Maint Console | Mini Maint[4] | — |
| CPU | 68040[4] | — |
| Software Version | 7.65[4] | — |
| Comms | HSMS[4] | — |
| RP/ ATM | RP[4] | — |
| Vacuum Load Locks | No[4] | — |
| WHC Gate Valve | Swing[4] | — |
| WHC Robot Arm | Wide[4] | — |
| Reactor Isolation | HVA[4] | — |
| ATM Valve | VAT[4] | — |
| Pressure Controller | MKS 152 Analogue[4] | — |
| PCV Type | MKS 253B[4] | — |
| Choke Valve | Yes[4] | — |
| RP Orientation | Bottom Feed[4] | — |
| Gas Panel Orientation | Top Feed[4] | — |
| Main H2/N2 | 100slm[4] | — |
| Cross Purge Valves | Yes[4] | — |
| Wafer Size | 200mm[5] | — |
| Supply Voltage / Freq | 480 / 50[1] | — |
| Configuration | RP[1] | — |
| HCL Hi | 20slm[7] | — |
| Supply Voltage / Frequency | 480 V / 50 Hz[4] | — |
| Maintenance Console | Mini Maint[4] | — |
| Communications | HSMS[4] | — |
| Main H2/N2 Flow | 100 slm[4] | — |
| Shaft MFC | 5 slm[4] | — |
| P Dopant Loop | Yes[4] | — |
| N Dopant Loop | Yes, Teed PH3/AsH3[4] | — |
| Aux1 Gas (SiH2Cl2) | 500 sccm[4] | — |
| Aux2 Gas (SiH4) | 105 sccm[4] | — |
| HCL High | 20 slm (some 30 slm)[4] | — |
| HCl Low | 2000 sccm (some 1000 sccm, 500 sccm)[4] | — |
| TCS | 25 gpm LVC[4] | — |
| DCS Cabinet | Yes[4] | — |
| TCS Mini Bubbler | 10L LPE[4] | — |
| Gas Detection | Gastec H2/HCl[4] | — |
| Temperature Controller | Foxboro[4] | — |
| Analog Ratio Control | Yes[4] | — |
| Wafer Size Kits Available | 100 mm, 150 mm, 200 mm[1] | — |
| Unit Vintage (example unit) | 2001[1] | — |
| OEM | ASM[5] | — |
| Model | E 2000[5] | — |
| Equipment name | ASM E 2000 Epitaxial Reactor[5] | — |
| Category | Deposition[5] | — |
| Wafer sizes | 8 inch[5] | — |
| Supply voltage / frequency | 480 / 50[5] | — |
| Dep/Vent transition valves | Yes[5] | — |
| ATM/RP vent | Yes[5] | — |
| P loop MFCs Dil/SRC/INJ | 20slm/175/175[5] | — |
| N loop MFCs Dil/SRC/INJ | 20slm/175/175[5] | — |
| Aux1 | SiH2Cl2 500sccm[5] | — |
| Aux2 | SiH4 105sccm[5] | — |
| Aux3 | None[5] | — |
| Aux4 | GeH4 2000sccm[5] | — |
| Aux5 | GeH4 175sccm[5] | — |
| HCl Hi | Yes 20slm[5] | — |
| Precision vent matching | Yes[5] | — |
| System type | — | Molecular Vapor Deposition (MVD) system[3] |
| Configured models | — | MVD300 / MVD300E[3] |
| Target manufacturing use | — | High volume manufacturing applications[3] |
| Processing mode | — | Batch processing[3] |
| Wafer handling | — | 200mm wafers (Pod loader or EFEM available); 300mm wafers (EFEM enabled)[3] |
| Other substrate formats | — | Singulated die on tape frames; components on trays; custom substrate fixturing available[3] |
| Precursors | — | Up to 4 precursors[3] |
| Integrated functions | — | Integrated plasma surface treatment and chamber clean capability[3] |
| Automation | — | Automated process sequence routines[3] |
| Diagnostics | — | Extensive self-diagnostic and data logging capability[3] |
| Reliability | — | Exceptional reliability[3] |
| Process compatibility | — | MVD and ALD-capable[3] |
| Wafer size | — | 200mm (Pod loader or EFEM) / 300mm (EFEM)[3] |
| Number of precursors | — | Up to 4[3] |
| Plasma treatment | — | Integrated plasma surface treatment and chamber clean capability[3] |
| Substrate types | — | Wafers, singulated die on tape frames, components on trays, custom fixturing[3] |
| ALD capability | — | MVD and ALD-capable[3] |
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