Comparison ledger
Applied Materials VIISta Plad High Current, Varian Viision 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta Plad High CurrentApplied Materials | Viision 200Varian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1996– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISTA | Varian Viision 200 |
| Cited variants | — | |
| Specifications | ||
| Configuration | Chamber only[1] | Medium Current[2] |
| Phase | — | 3 Phase[3] |
| Wafer size | — | 8 inch (200 mm)[2] |
| Process type | — | Batch[5] |
| Current type | — | High Current[5] |
| Energy range (VIISion 200 PLUS2) | — | Up to 200 keV[5] |
| Energy range (VIISion 80LE) | — | 250 eV to 80 keV[5] |
| Electrical requirements | — | 3 Phase, 5 Wire, 208 V, 50/60 Hz[3] |
| Voltage | — | 208 Volt[3] |
| Frequency | — | 50/60 Hz[3] |
| Vintage | — | 2000[3] |
| Uptime | — | over 85%[5] |
| Equipment type | — | Ion implanter[2] |
| Model | — | Viision 200[2] |
| Current class | — | High current[5] |
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