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Comparison ledger

VIISta 810 XEriversusEHPI E 220

Applied Materials VIISta 810 XEri, Varian EHPI E 220, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Ion Implantation, null[1]
Side-by-side comparison of selected equipment models
Attribute
VIISta 810 XEriApplied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials VIISta 810Varian EHPI E 220
Specifications
ConfigurationMedium Current[1]Medium Current[2]
Wafer Size12-inch[1]—
Implant Current CategoryMedium Current[1]—
SMIF Interface—Varian Interface for Brooks SMIFS[2]
Line Voltage—3 Phase, 208 V[2]
Line Frequency—50 / 60 Hz[2]
UPS—CVCS[2]
Gas Box—4 Sticks, HP and SDS 2 in use[2]
HE MFC Size—Optional[2]
Type—Cryopump on board 4 f[2]
Cassette Stage—200 mm (8") Standard[2]
Wafer Mapping—Optical Sensor[2]
Lamp Colors—Red, Orange, Green[2]
Chiller—Heat Exchange[2]
DI Cart—EHPI with B-Pure Filters[2]
Make—Varian[2]
Model—EHPI E 220[2]
Category—Ion Implantation[3]
Wafer Sizes—8 inch[2]
System description—8-inch, medium-current system with a SMIF interface[3]
Vacuum—Cryopump on board 4 f[3]
Gas delivery—4 Sticks, HP and SDS 2 in use[3]
Chambers—2[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com