Waferpedia

Comparison ledger

Producer SversusConcept One 150

Applied Materials Producer S, Lam Research Concept One 150, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: Deposition, null[1]
Side-by-side comparison of selected equipment models
Attribute
Producer SApplied Materials
Concept One 150Lam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials ProducerLam Research Concept One 150
Specifications
ConfigurationTEOS[1]TEOS[2]
Phase3 Phase[1]—
Frame Type—C1-150[4]
Process Types—SiO2, SiN, Nitride[4]
Chamber—Dielectric[4]
Cassette Platform—C1 150mm[4]
Front, Side Monitors—LCD[4]
Wafer Size—6 inch[2]
Process Type (SiO2)—SiO2[4]
Process Type (SiN)—SiN[4]
Process Type (Nitride)—Nitride[4]
Chamber Type (Dielectric)—Dielectric[4]
Chamber Type (Tungsten)—Tungsten[4]
Robot—Single Arm[4]
Monitor Type—LCD[4]
Communication—SECS / GEMS[4]
Micro Contamination Option—Yes[4]
Heated Valves—Yes[4]
Monitors—Front and side LCD[4]
Interface—SECS/GEMS[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]inventory listing