Waferpedia

Comparison ledger

PLADversus0216 7696, E 11368072 ESC

Applied Materials PLAD, Varian 0216 7696, E 11368072 ESC, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
PLADApplied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials PLADVarian 0216 7696, E 11368072 ESC
Specifications
ManufacturerApplied Materials[1]—
ModelPLAD[1]—
CategoryIon Implantation[1]Ion Implantation[4]
Tool typePlasma Doping Ion Implanter[2]—
Wafer size300 mm[2]—
Configuration—Platen ADV-S Type[3]
Type—ESC Platen ADV-S Type[3]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com