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Comparison ledger

Centura TPCC RTP XE+ RTPversus1000 Hot Plate

Applied Materials Centura TPCC RTP XE+ RTP, CEE 1000 Hot Plate, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura TPCC RTP XE+ RTPApplied Materials
OEMApplied MaterialsCEE
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials Centura TPCCCEE 1000 Hot Plate
Specifications
Phase3 Phase[1]—
Configuration4 Wire[1]4"[2]
Voltage208 Vac[1]—
Type—Hot Plate[2]
Wafer Size—4 inch[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing