Comparison ledger
Applied Materials 0020 17485 Part, Veeco IBS-2 Ion Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0020 17485 PartApplied Materials | IBS-2 Ion BeamVeeco |
|---|---|---|
| OEM | Applied Materials | Veeco |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0020 17485 Part | Veeco IBS-2 Ion Beam |
| Specifications | ||
| Configuration | Strap, RF Out 2 Balanced Coil Match, Hdp[1] | 6 targets[2] |
| Type | — | Ion Beam Deposition (IBD)[2] |
| Category | — | Deposition[3] |
| Wafer size | — | 6 inch[4] |
| Targets | — | 6 targets[2] |
| Ion guns | — | Two ion guns[2] |
| Ion beams | — | 2 fully functional ion beams[2] |
| Neutralizer | — | Plasma Bridge Neutralizer[2] |
| Vacuum and pumping | — | Refurbished turbo pump; 2 cryo pumps; 2 Edwards XDS10 scroll pumps[2] |
| Chiller | — | Chiller unit[2] |
| Air compressor | — | New air compressor[2] |
| RF generator | — | Upgraded with a new RF generator[2] |
| Chucks | — | 6" chuck for round wafers; 7" chuck for square wafers[2] |
| Tool family | — | Veeco IBS-2 Ion Beam family, 1 entry[4] |
| Process type | — | Deposition (IBD)[4] |
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