Comparison ledger
Applied Materials 0010 47763, Tokyo Electron SCCM Shin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | SCCM ShinTokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Tokyo Electron SCCM Shin |
| Specifications | ||
| Configuration | 2nd Source New[1] | — |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | Oxide etcher with qty 3 chambers[6] |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | SCCM Shin[4] |
| OEM | Applied Materials[1] | Tokyo Electron[4] |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Category | — | Etch[5] |
| Vintage | — | 2005[4] |
| Version | — | 300 mm[6] |
| Tool type | — | TSP-30555SSS[6] |
| Load ports | — | 3[6] |
| Etch process chambers | — | 3[6] |
| RF generator (top) | — | Daihen AGA-50B 60 MHz 5 kW[6] |
| RF generator (bottom) | — | Daihen WGA-50E 2 MHz 5 kW[6] |
| Other chamber component | — | Daihen DGP-120A2[6] |
| Gate valves | — | Vat gate valves[6] |
| Vacuum pumps | — | Shimadzu turbo pumps[6] |
| DC power supplies | — | Kyosan DC power supplies[6] |
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