Comparison ledger
Applied Materials 0010 47763, STS Multiplex ICP Advanced Oxide, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | |
|---|---|---|
| OEM | Applied Materials | STS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | STS Multiplex ICP |
| Specifications | ||
| Configuration | 2nd Source New[1] | 80 A[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Voltage | — | 208 V[4] |
| Frequency | — | 60 Hz[4] |
| RF Generators | — | ENI ACG10B 1kW (13.56MHz)[4] |
| Clamp Type | — | Standard WTC[4] |
| Platen Type | — | Domed[4] |
| Turbo Pump | — | None[4] |
| MACs Robot | — | None[4] |
| Pumping System | — | None[4] |
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