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Comparison ledger

0010-22161 High EFF RF MatchversusGamma

Applied Materials 0010-22161 High EFF RF Match, SUSS MicroTec Gamma, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
GammaSUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchSUSS MicroTec GAMMA
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Type—Coater / Developer[3]
Wafer size support—100mm through 200mm[4]
Maximum substrate size—8 inch[5]
Process capabilities—DUV resist and ARC coating, wafer baking, wafer developing, conformal coating on pieces to 200mm wafers[4]
Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]cnfusers.cornell.educnfusers.cornell.edu
  5. [5]nnci.netnnci.net