Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Hitachi Z-5310, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Z-5310Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Hitachi Z-5310 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Insp | — | spectrophotometer/flame[3] |
| Optical system | — | Polarized Zeeman correction (DC magnetic field)[4] |
| Spectroscope | — | Czerny-Turner mount[4] |
| Burner | — | Premix type (titanium)[4] |
| Atomization | — | Flame method (standard)[4] |
| Wavelength range | — | 190 to 900 nm[4] |
| Light source | — | Hollow cathode lamp (multi-element lamp turret)[5] |
| Detector | — | High-sensitivity photomultiplier tube[5] |
| Flame composition | — | Air-acetylene flame, nitrous oxide-acetylene flame (requires switching)[5] |
| Photometry | — | Double-beam (D2 background correction), single-beam (Zeeman)[5] |