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Comparison ledger

0010-18024 Pyrometer AssemblyversusS 9300 CD-SEM

Applied Materials 0010-18024 Pyrometer Assembly, Hitachi S 9300 CD-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsHitachi
CategoryMetrology & InspectionMetrology & Inspection
Wafer size—Wafer imaging ability; entire surface of 8” or 12” wafer
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-18024 Pyrometer AssemblyHitachi S 9300 CD-SEM
Specifications
ConfigurationCapable of working on Applied Materials Radiance[1]2 cassette holders with ergo flippers[2]
Electron Gun—Schottky emission source[2]
Accelerating voltage—500V to 1600V, 10V steps[2]
Probe Current—4~24 pA with automated setting and measurement by Faraday cup[2]
Electromagnetic Lens—3-Stage Electromagnetic Lens System with boosting voltage[2]
Objective Lens—4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[2]
Scan Coil—2-Stage Electromagnetic Deflection[2]
Wafer size—Wafer imaging ability; entire surface of 8” or 12” wafer[2]
Depth of focus—≥ 1.0 um at 80000x magnification[2]
Resolution—3 nm (800V) Retarding/Boosting Mode[2]
Magnification—1000x to >300000x[2]
Wafer Imaging—entire surface of 8” or 12” wafer[2]
Workstation—HP B180L with HP-UX 10.20 or newer[2]
Field of View—1.2 mm[2]
Model—HP B180L (9GB)[2]
O/S—Unix version HP-UX 10.20 or newer[2]
Software Version—14.71 or newer[2]
Tool type—Critical Dimension Scanning Electron Microscope (CD-SEM)[2]
Wafer size support—8 inch[2]
Wafer imaging ability—Entire surface of 8" or 12" wafer[2]
Category—Metrology & Inspection[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com