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Comparison ledger

0010-13622 RF Match forversusCCS pro AR

Applied Materials 0010-13622 RF Match for, Leybold CCS pro AR, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
CCS pro ARLeybold
OEMApplied MaterialsLeybold
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLeybold CCS pro AR
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]1x HPE6 Egun with 7 pockets[2]
Model0010-13622[1]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Phase—3 Phase[2]
Voltage—400 V AC[2]
Frequency—50 Hz[2]
Power—20 KVA[2]
Mechanical pump—Leybold D65B[2]
High vacuum pump—Turbomolecular[2]
E-gun—1x HPE6 Egun with 7 pockets[2]
Ion source—1x MkI ion source[2]
Dome tooling—Dome tooling[2]
Polycold—Polycold[2]
Domes—2 domes[2]
Drop rings—2 sets of drop rings[2]
Dome holder for loading—1 dome holder for loading[2]
Spare set of shields—Spare set of shields[2]
Manuals and documentation—Hard copies of manuals and documentation[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing