Comparison ledger
Applied Materials 0010-03485 Magnet Assy, SUSS MicroTec Delta 12 AQ Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Delta 12 AQ SpinSUSS MicroTec |
|---|---|---|
| OEM | Applied Materials | SUSS MicroTec |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | SUSS MicroTec Delta 12 AQ Spin |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Maximum wafer diameter | — | 200 mm[5] |
| Maximum substrate thickness | — | 5 mm[5] |
| Supported wafer diameters | — | 50 mm, 75 mm, 100 mm, 150 mm, 200 mm[5] |
| Supported photomask sizes | — | 125 mm x 125 mm, 150 mm x 150 mm[5] |
| Supported developer chemistries | — | AZ400K, AZ300MIF, CD26[5] |
| Operation type | — | Recipe controlled automated operation[5] |
| Developer temperature control | — | Precise control[5] |
| Substrate handling | — | Cassette-to-cassette dry in-dry out[5] |