Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Semitool SST 421 Spray Solvent, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | SST 421 Spray SolventSemitool |
|---|---|---|
| OEM | Applied Materials | Semitool |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Semitool SST 421 Spray Solvent |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | Semitool[7] |
| Model | 0010-03485[1] | SST-421[6] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | Spray Solvent Tool[8] |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | 8"/200mm[6] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Semitool[7] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Voltage | — | 400 Vac / 35 A[5] |
| Tool type | — | Automated Spray Solvent Tool (SST)[6] |
| Process role | — | Batch Solvent Processor for Wafer Cleaning[6] |
| Number of tanks | — | 4[10] |
| Number of heated tanks | — | 2[10] |
| Single chamber | — | Yes[6] |
| Rotor included | — | 1 rotor included[6] |
| Process type | — | Batch solvent processor for wafer cleaning[6] |
| Process applications | — | Polymer removal, resist stripping, wafer cleaning, metal lift-off[6] |
| Max wafer size | — | 8"/200mm wafers[6] |
| Max substrate size | — | 8"/200mm[9] |
| Chambers | — | Single chamber[6] |
| Rotor | — | 1 rotor included (select size at time of order)[6] |
| Tanks | — | 4 stainless steel tanks (2 heated, 2 ambient)[6] |
| Operation | — | Automated spray solvent tool[6] |