Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Pfeiffer Alcatel 2033 Rotary Vane, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Alcatel 2033 Rotary VanePfeiffer |
|---|---|---|
| OEM | Applied Materials | Pfeiffer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Pfeiffer Alcatel |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Serviced with Alcatel TA101 Thermocouple[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | 2033[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | Rotary vane pump[5] |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Make | — | Pfeiffer / Alcatel[5] |
| Type | — | Mechanical forepumps[6] |
| Number of stages | — | 2[7] |
| Nominal rotational speed | — | 1,500 rpm[7] |
| Nominal pumping speed | — | 30 m3/h (23.3 cfm) at 50Hz[7] |
| Pneurop pumping speed | — | 27 m3/h (18.8 cfm) at 50Hz[7] |
| Ultimate partial pressure | — | 2 x 10^-4 mbar[7] |
| Ultimate total pressure open gas ballast | — | 2 x 10^-2 mbar[7] |
| Oil capacity | — | 3.6 liters[7] |
| Weight | — | 61 kg (134 lbs)[7] |
| Inlet and outlet flanges | — | ISO-KF DN 40[7] |
| Serviced with | — | Alcatel TA101 Thermocouple[5] |
| Gas ballast | — | Manual gas ballast[7] |