Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus722C

Applied Materials 0010-03485 Magnet Assy, MKS 722C, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
722CMKS
OEMApplied MaterialsMKS
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyMKS 722C
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Accuracy—0.50% of reading[5]
Full Scale Range—1 to 25,000 Torr (1.33 x 10^2 to 3.33 x 10^6 Pa)[5]
Overpressure Limit—310 kPa (2325 Torr)[5]
Signal Output—0 - 10 VDC[5]
Supply Voltage—24 Volts @ 1 Amp[5]
Communication—RS232 standard, RS485 optional[5]
Product Type—Capacitance manometer (Baratron)[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]api.p1.mks.comapi.p1.mks.com