Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Hitachi Z-5010, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Z-5010Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Hitachi Z-5010 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Insp | — | spectrophotometer/Zeeman[5] |
| Light Source | — | Hollow cathode lamp (hollow cathode lamp)[6] |
| Optical System | — | Polarized Zeeman correction (DC magnetic field)[6] |
| Spectrometer | — | Czerny-Turner mount[6] |
| Detector | — | Photomultiplier tube[6] |
| Measurement Mode | — | Flame method[6] |
| Wavelength Range | — | 190-900 nm[7] |
| Resolution | — | 0.2 nm[7] |
| Dimensions (W x D x H) | — | 600 mm x 600 mm x 400 mm[7] |
| Weight | — | Approx. 40 kg[7] |
| Maximum Number of Elements | — | 6 elements[7] |
| Analysis Methods | — | Polarized Zeeman method, air-acetylene method, nitrous oxide method[7] |