Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Edwards iXH 1220 HTX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | iXH 1220 HTXEdwards |
|---|---|---|
| OEM | Applied Materials | Edwards |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Edwards IXH |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | 30/50Hz[6] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Main Input | — | 3-200-230V[5] |
| Type of product | — | dry pump[7] |
| Inlet | — | ISO100[7] |
| Exhaust | — | KF40[7] |
| Pumping speed | — | 735.72 CFM[7] |
| Ultimate pressure | — | 3.7 x 10^-3 Torr[7] |
| Weight | — | 1,007 lbs[7] |
| Frequency | — | 30/50Hz[5] |
| Current | — | 38A[5] |