Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusLP-6J

Applied Materials 0010-03485 Magnet Assy, Brooks LP-6J, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
LP-6JBrooks
OEMApplied MaterialsBrooks
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyBrooks LP-6J
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Series—LP Series[5]
Depth—Low Profile 1.2" Depth[5]
Jaw form—4S[5]
Design use—Communication cable routing, monitor equipment, and service provider access[5]
Direct access feature—Can accommodate an RJ-11 telephone jack[5]
Construction—One-piece injection molded polycarbonate shell and clear polycarbonate dead-front safety shield[5]
Meter Form—4S[5]
Design Purpose—Communication cable routing, monitor equipment, service provider access, accommodates RJ-11 telephone jack[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]brooksutility.combrooksutility.com