Comparison ledger
Applied Materials 0010-03254 E Chuck, Nikon NSR SF 130, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | NSR SF 130Nikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Nikon NSR SF 130 |
| Specifications | ||
| Exposure Wavelength | — | i-line (365 nm)[1] |
| Numerical Aperture | — | ~0.50[1] |
| Max Wafer Size | — | 200 mm[1] |
| Throughput | — | ~100 wafers/hour[1] |
| Common Process Node | — | ≥ 0.25 μm[1] |
| Release Era | — | Early 2000s[1] |
| Optical System | — | High-quality projection lenses optimized for i-line lithography[1] |
| Stage and Alignment | — | Precision wafer stage with interferometer-based positioning, sub-micron alignment accuracy[1] |
| Automation | — | Motorized reticle loaders, wafer handling robots, SMIF pods[1] |
| Control Electronics | — | Proprietary Nikon control software and hardware[1] |