Waferpedia

Comparison ledger

0010-03254 E ChuckversusSpin

Applied Materials 0010-03254 E Chuck, CEE Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
SpinCEE
OEMApplied MaterialsCEE
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—CEE Spin
Specifications
Equipment type—Spin coater[1]
Asset number—142901[1]
Make—CEE[1]
Substrate size—up to 200mm round or 7 in. square[2]
Maximum spin speed—6000 rpm[2]
Base system—Brewer Science CEE 200CBX precision coat-bake system[2]
Function—photoresist spinners[2]
Spin speed—up to 6000 rpm[2]
Spin Coater #1 feature—programmable Precision Hot Plate Bake[2]
Spin Coater #2 type—stand-alone spinner[2]
Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]cores.research.asu.educores.research.asu.edu