Comparison ledger
ABM -407B-1-S-CES293 Robot, Nikon NWL 851 Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NWL 851 WaferNikon | |
|---|---|---|
| OEM | ABM | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-1-S-CES293 Robot | Nikon NWL 851 Wafer |
| Specifications | ||
| Model | ABM-407B-1-S-CES293[1] | NWL 851[2] |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Objective lens | — | CF Plan 5 × BD NA0.135 / 10 × BD NA 0.30 / 50 × BD NA 0.80[2] |
| Eyepiece | — | CFIUW 10 /25 × 2 (magnification 10 ×, field of view 25 mm)[2] |
| Tube | — | 3 erect images, with C-mount adapter[2] |
| Observation method | — | reflected bright field/reflected dark field[2] |
| Revolver | — | ACP 21 with motorized switching controller (5 holes)[2] |
| Stage | — | Large 8-inch compatible stage, lower right handle (clutch-free mechanism), X-Y stroke 205 mm, 8-inch rotating holder[2] |
| Illumination device | — | LA 150 UX (halogen lamp 150 W[2] |
| Make | — | Nikon[2] |
| Type | — | Wafer Loader[2] |