Comparison ledger
ABM -407B-1-S-CES293 Robot, Hitachi 9220, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 9220Hitachi | |
|---|---|---|
| OEM | ABM | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-1-S-CES293 Robot | Hitachi 9220 |
| Specifications | ||
| Model | ABM-407B-1-S-CES293[1] | — |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Length Measurement Reproducibility | — | ± 1% or 3 nm (3σ) larger value[2] |
| Secondary Electron Image Resolution | — | 3 nm at acceleration voltage 0.8 kV[2] |
| Acceleration Voltage | — | 500 to 1600 V (variable in 10 V steps)[2] |
| Throughput (continuous measurement mode) | — | 56 wafers / hr[2] |
| Measuring Range | — | 0.1 μm to 2.0 μm[2] |
| Image Magnification (SEM) | — | 1k to 300k times[2] |
| Stage Movement Range (X-axis) | — | 0-200 mm[2] |
| Stage Movement Range (Y-axis) | — | 0-200 mm[2] |
| Stage Drive Speed | — | Max. 100 mm / sec (each X-axis & Y-axis)[2] |
| Lens System | — | Electromagnetic Lens System, Booster Stock Lens[2] |
| Detection System | — | Scintillator / photomultiplier detector using EXB filter; 2 stage detection method for SE and BSE images[2] |
| Power Supply (208V variant) | — | 208 V, 60 Hz, Single Phase[2] |
| Power Supply (100V variant) | — | 100V, 60 Hz, Single Phase, 6kVA[2] |
| Power Supply (200V variant) | — | 200V, 60 Hz, Single Phase[2] |
| Wafer Sizes Supported | — | 2-inch, 8-inch, 12-inch[2] |