Waferpedia

Comparison ledger

160 XP IonversusViision 200 + High Current

Varian 160 XP Ion, Varian Viision 200 + High Current, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMVarianVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 160 XP IonVarian Viision 200 + High Current
Specifications
Configuration150mm High Current IMP[1]—
OEMVarian[2]—
Model160 XP Ion[2]—
CategoryIon Implantation[1]—
Tool typeion implanter[1]—
Wafer size—200 mm[3]
Power requirements—208 V, 140 A, 50/60 Hz, 3 Phase[4]
Cassette to cassette—Yes[4]
Bernas ion source—Yes[3]
Two-dimensional beam profiler—Yes[3]
CE-marked—Yes[3]
Computer system—147 MHz Main & ES CPU[3]
Cryo pumps—4× CTI 250F, 2× CTI 9600 compressors[3]
Frequency kit—50 Hz[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]fabsurplus.comfabsurplus.com
  4. [4]surplus.infineon.comsurplus.infineon.com