Waferpedia

Comparison ledger

0332 F 9453 302 Diffusionversus310TA

Varian 0332 F 9453 302 Diffusion, YES 310TA, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMVarianYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—up to 6-inch wafers
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 0332 F 9453 302 DiffusionYES 310TA
Cited variants—
Specifications
Asset Number142841[2]—
Last Confirm DateOctober 14, 2025[3]—
Model—310TA[4]
Equipment type—HMDS Vapor Prime Oven[4]
Description—Vacuum cure & HMDS vapor prime oven[5]
Priming agent—HMDS in vapor phase[5]
Process temperature—150 °C[5]
Exposure time—300 s[5]
Total process time including purges—~15 min[5]
Carrier capacity—25 slots for 4-inch or 6-inch wafers per cassette[5]
Wafer compatibility—up to 6-inch wafers[5]
Process type—HMDS vapor priming[5]
Temperature—150 °C[5]
Total process time—~15 min[5]
Wafer capacity—25 slots for 4″ or 6″ wafers[5]
Maximum wafer size—up to 6-inch[4]
HMDS exposure time—300 seconds[5]
Wafer size capacity—up to 6-inch[4]
Cassette capacity—25 slots for 4" or 6" wafers[5]
Wafer size—up to 6-inch wafers[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]Equipment inventory listing
  3. [3]fab-spares.comfab-spares.com
  4. [4]colorado.educolorado.edu
  5. [5]epfl.chepfl.ch