Comparison ledger
Ulvac SOPHI 200 Ion, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SOPHI 200 IonUlvac | 160 XPVarian |
|---|---|---|
| OEM | Ulvac | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ulvac SOPHI 200 Ion | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Dose range (actual dose | 1010~1014 ions/cm2)[2] | — |
| Beam current (~500μA) - Throughput | more than 100 pieces/h (6in)[2] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
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