Comparison ledger
Tokyo Electron Lithius Pro, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Lithius ProTokyo Electron | 1000 FamilyUltratech |
|---|---|---|
| OEM | Tokyo Electron | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2025 Announcement of LITHIUS Pro DICE | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Lithius | Ultratech 1000 Family |
| Cited variants | — | |
| Specifications | ||
| Configuration | Immersion COT and DEV[3] | — |
| Equipment type | Coater / Developer[3] | — |
| Process description | Immersion COT and DEV[3] | — |
| Pre-/post-exposure process | With rinse process at pre-/post exposure[3] | — |
| FOUP exchanger | 1 FOUP exchanger[3] | — |
| Application | Lithography process (ArF Immersion, ArF, KrF, i-line)[1] | — |
| Throughput | Maximum 250 wph capable in future; 200 wph capability with future upgradeability to 250 wph[1] | — |
| Integration | Optimized integration with the exposure tool for maximizing litho cell throughput[1] | — |
| Chemical consumption | Drastically reduced chemical consumption[1] | — |
| Wafer Size | 300mm[2] | — |
| Throughput (LITHIUS Pro V) | 200 wph (upgradeable to 250 wph)[1] | — |
| Applications | ArF Immersion, ArF, KrF, i-line lithography[1] | — |
| Date of Manufacture (example unit) | 2010-04-15[4] | — |
| Software Version (example unit) | 300.0.88.3[4] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[5] |
| Optical design | — | Wynne Dyson[5] |
| Magnification | — | 1X[5] |
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