Comparison ledger
Tokyo Electron Clean Track Act 8 Resist, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Clean Track Act 8 ResistTokyo Electron | 1000PYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1998 Vintage year | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Clean Track | YES 1000P |
| Cited variants | — | |
| Specifications | ||
| Configuration | Single Block[1] | Parallel plate[7] |
| System | Right to Left[4] | — |
| Main robot | 3 Pincette Arm[4] | — |
| Manufacturer | Tokyo Electron[1] | — |
| Model | Clean Track Act 8[1] | 1000P[6] |
| Type | Resist Coater / Developer[1] | — |
| Wafer Sizes | 6 inch, 8 inch[3] | — |
| Equipment type | Resist coater/developer[1] | — |
| Supported wafer sizes | 6 inch, 8 inch[1] | — |
| Supported Wafer Size | 8 inch[1] | — |
| System type | — | Plasma cleaning system[6] |
| Shelf configuration | — | Four 16 x 16 inch shelves[6] |
| Total capacity | — | 1024 square inches[6] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[6] |
| Number of shelves | — | 4[6] |
| Shelf size | — | 16 x 16 inches[6] |
| Power | — | 1000 W[7] |
| Operation modes | — | Active, RIE, Downstream[6] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[6] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →