SUSS MicroTec
MA100 / 150e Gen2 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
GCA
6300 DSW
150mm
Lithography
The GCA 6300 DSW is a g-line wafer stepper used for lithography, with source descriptions also identifying related i-line GCA 6300 stepper documentation.
Raith
EBPG5000
150mm
Lithography
SUSS MicroTec
MA / BA Gen4 Pro Series
150mm
Lithography
The MA / BA Gen4 Pro Series is a semi-automated mask aligner and bond aligner system supporting wafers up to 150 mm / 200 mm, with capabilities for exposure, UV bonding, fusion bonding, micro- and nanoimprinting, and selective plasma activation.
Karl Suss
MA6
150mm
Lithography
The Karl Suss MA6 is a high-resolution semi-automated photolithography mask aligner for research, development, and small-volume production.
SUSS MicroTec
MA6-BA6
150mm
Lithography
The JEOL JBX-6300FS is an advanced direct-write electron beam lithography system for up to 150mm wafers.
Heidelberg Instruments
MLA150
150mm
Lithography
The Heidelberg Instruments MLA150 is a mask-less direct-write lithography system for exposing photoresist on substrates without a photomask.
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