SUSS MicroTec
MA 8 BA 8 Gen 5 S Compact Mask alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
KLA
ICOS CI 8 X 50 Lead
Lithography
KLA ICOS CI 8 X 50 Lead is a lead scanner described with 3.4 kW power and related operating requirements.
Quintel
Q 7000 Mask
Lithography
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
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