Comparison ledger
SUSS MicroTec MA 200 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA 200 MaskSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA 200 | Ultratech 1000 Family |
| Specifications | ||
| Configuration | With CIC1000 lamp housing[1] | — |
| Hardware | Intel Standard[1] | — |
| Operation | Semi-automatic[1] | — |
| Wafer sizes | 6 inch, 8 inch[1] | — |
| Optics | UV400/cont/W-200[1] | — |
| Sensor | 365/405 dual range[1] | — |
| Lamp housing | CIC1000[1] | — |
| Computer hardware | Intel Standard[1] | — |
| Alignment system | SUSS AL3000 Auto Align[1] | — |
| Microscope | DVM8 with Sony cameras, L25X Objective (qty 2)[1] | — |
| Mask holder | with Guard[1] | — |
| Field Expanders | Yes[1] | — |
| Wafer sizes (from other listing) | 6, 8 inch[2] | — |
| OEM | SUSS[1] | — |
| Model | MA 200[1] | — |
| Equipment type | Mask Aligner[1] | — |
| Wafer size | 8 inch[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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