Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec MA 14 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | MA 14 MaskSUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec MA 14 Mask |
| Specifications | ||
| Exposure source | — | 350W mercury lamp[1] |
| Wafer size | — | 4 inches[1] |
| Mask size | — | 5 inches[1] |
| Microscope objectives | — | 5x and 10x[1] |
| Alignment type | — | Topside alignment[1] |
| Exposure modes | — | Proximity, soft contact, hard contact, vacuum contact[1] |
| Stage adjustments | — | X, Y, θ fine adjustment[1] |
| Wedge error compensation | — | Yes[1] |
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