Comparison ledger
SCREEN SU 3200, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SU 3200SCREEN | 11600 SRDSemitool |
|---|---|---|
| OEM | SCREEN | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SCREEN SU 3200 | Semitool 11600 SRD |
| Specifications | ||
| Configuration | Chemicals Used: - H3PO4 (Phosphoric Acid) - IPA (Isopropyl Alcohol) - H2O2 (Hydrogen Peroxide) - TM-Y Chemical Tanks / Channels: - 12 channels FOUP Ports: - 4[1] | Ceramic[4] |
| Make | SCREEN / DNS[1] | — |
| Model | SU 3200[1] | 11600 SRD[4] |
| Tool type | single-wafer cleaner[2] | — |
| Wafer size | 12 inch (300 mm)[3] | — |
| Maximum throughput | up to 800 wafers per hour[3] | — |
| Maximum chambers | up to 12 chambers[3] | — |
| Chamber arrangement | 12 chambers in four three-level towers[3] | — |
| Wafer handler | Kawasaki robot[3] | — |
| Chemical supply system | dynamic direct injection (DDI) or cabinet-type chemical supply system[3] | — |
| Communication protocol | SECS/GEMS[3] | — |
| Software version | P2485STD00V2485STD00[3] | — |
| Power rating | 208AC-3 Phase[3] | — |
| Chemicals used | H3PO4 (Phosphoric Acid), IPA (Isopropyl Alcohol), H2O2 (Hydrogen Peroxide), TM-Y[1] | — |
| Chemical tanks / channels | 12 channels[1] | — |
| FOUP ports | 4[1] | — |
| Manufacturer | — | Semitool[4] |
| Equipment type | — | Spin Rinse Dryer[4] |
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