Comparison ledger
Quintel Q 7000 Mask, SUSS MicroTec MA 8 BA 8 Gen 5 S Compact Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Q 7000 MaskQuintel | MA 8 BA 8 Gen 5 S Compact MaskSUSS MicroTec |
|---|---|---|
| OEM | Quintel | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Quintel Q 7000 Mask | SUSS MicroTec MA 8 Mask |
| Cited variants | — |
|
| Specifications | ||
| Configuration | complete with Optek QTL2001 optics and IR illumination package[1] | For imprint processing[2] |
| Power supply | — | 3x 400V AC + N + PE / 50-60Hz[2] |
| Max fuse rating machine | — | 30amp[2] |
| Max fuse rating facility | — | 40amp[2] |
| Connection cable | — | 5x AWG8 length 16ft / 5m open end, no connector[2] |
| Outer tube diameter | — | 6mm[2] |
| Max length | — | 2m[2] |
| According to purity level ISO 8573-1 | — | 2010, [5:6:4][2] |
| CDA Consumption | — | ca. 1 m3/h (LH350)[2] |
| AIC or main interrupt and breakers | — | 15 kA IEC[2] |
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