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Plasmalab 100 ICP 180 RIEversus1512e

Oxford Instruments Plasmalab 100 ICP 180 RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Plasmalab 100 ICP 180 RIEOxford Instruments
1512eTegal
OEMOxford InstrumentsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOxford Instruments Plasmalab 100Tegal 1512e
Specifications
Voltage208V, 50/60Hz[1]—
ConfigurationWith VAT PM-5 Adaptive Pressure Controller[1]—
ManufacturerOxford Instruments[1]—
ModelPlasmalab 100 ICP 180[1]—
Tool typeReactive Ion Etcher[1]Industrial RIE plasma etcher system[3]
CategoryEtch[2]—
Wafer size6 inch[1]—
Power208V, 50/60Hz[1]—
Adaptive pressure controllerVAT PM-5[1]—
Turbopump controllerAdixen ACT 1300M[1]—
Vacuum pumpLeybold D65BCS with oil filter and exhaust filter[1]—
Gas deliveryGas Box[1]—
Control computerControl Computer (no HDD)[1]—
MonitorLCD Monitor[1]—
ChillerThermo Neslab Chiller[1]—
Computer cartComputer Cart[1]—
Stated configuration—With modules assembly for CI-4222[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]semistarcorp.comsemistarcorp.com