Comparison ledger
Ontrak DSS 200 Series II Wafer, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | DSS 200 Series II WaferOntrak | 1000PYES |
|---|---|---|
| OEM | Ontrak | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2023 Introduced | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Ontrak DSS 200 | YES 1000P |
| Specifications | ||
| Configuration | Post CMP[1] | Parallel plate[4] |
| Make | Ontrak[1] | — |
| Model | DSS 200 Series II Wafer[1] | 1000P[3] |
| Equipment type | Wafer Scrubber[1] | — |
| Wafer sizes | 6 inch[1] | — |
| Tool description | post-CMP semiconductor process tool[2] | — |
| Application | cleaning wafers after chemical mechanical polishing[2] | — |
| Wafer size | 8 inch[2] | — |
| System type | — | Plasma cleaning system[3] |
| Shelf configuration | — | Four 16 x 16 inch shelves[3] |
| Total capacity | — | 1024 square inches[3] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[3] |
| Number of shelves | — | 4[3] |
| Shelf size | — | 16 x 16 inches[3] |
| Power | — | 1000 W[4] |
| Operation modes | — | Active, RIE, Downstream[3] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[3] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →