Waferpedia

Comparison ledger

AK 800versus100 ICP Fluorine

Meyer Burger AK 800, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
AK 800Meyer Burger
100 ICP FluorineOxford Instruments
OEMMeyer BurgerOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyMeyer Burger AK 800Oxford Instruments 100 ICP Fluorine
Specifications
1. Magnetron headMuegge 3kW—
8. Gas boxBCl3, Cl2, C4F8, CF4, CF3H,—
19. Dry pumpEbara EV-S100P—
20. Dry PumpEbara EV-M202N-—
Vintage2015—
Etch/Asher Vintage2015—
Etch Gases—SF6, CF4, O2, Ar, N2, CHF3, C4F8[1]
Cryo DRIE etch rate—up to 5 µm/min[1]
Wafer size—4 inch, 6 inch, 8 inch (with clamp change)[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]nanofab.utah.edunanofab.utah.edu