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Comparison ledger

05 LHP 151versusLambda 750 Spectrophotometer

Melles Griot 05 LHP 151, Perkin Elmer Lambda 750 Spectrophotometer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
05 LHP 151Melles Griot
OEMMelles GriotPerkin Elmer
CategoryPrecision OpticsPrecision Optics
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyMelles Griot 05Perkin Elmer Lambda 750
Cited variants—
Specifications
ConfigurationWith 05 LPL 340 Power Supply (Does not power on)[2]UV-VIS + NIR[4]
Equipment typeLaser[2]—
MakeMelles Griot[2]—
Model05 LHP 151[2]—
Power stateDoes not power on[2]—
Operating System—Win7 Professional N[4]
Principle—Double beam, double monochromator, ratio recording UV/Vis/NIR spectrophotometer with microcomputer electronics, controlled by a DELL PC or compatible personal computer.[5]
Optical System—All reflecting optical system (SiO2 coated) with holographic grating monochromator with 1440 Lines/mm UV/Vis blazed at 240 nm and 360 Lines/mm NIR blazed at 1100 nm, Littrow mounting, sample thickness compensated detector optics.[5]
Beam Splitting System—Chopper (46+ Hz, Cycle: Dark/Sample/Dark/Reference, Chopper Segment Signal Correction CSSC).[5]
Detector—Photomultiplier R955 for high energy in the whole UV/Vis wavelength range; Peltier cooled PbS detector for NIR.[5]
Source—Pre-aligned tungsten-halogen and deuterium.[5]
Wavelength Range—190 nm - 3300 nm[5]
UV/Vis Resolution—≤ 0.17 nm[5]
NIR Resolution—≤ 0.20 nm[5]
Stray Light (at 200 nm, 12 g/L KCl USP/DAP method)—> 2 A ≤ 0.0001 %T[5]
Stray Light (at 220 nm, 10 g/L NaI ASTM method)—≤ 0.0001 %T[5]
Wavelength Accuracy—± 0.15 nm UV/Vis; ± 0.5 nm NIR[5]
Wavelength Reproducibility (UV/Vis, Deuterium Lamp Lines)—≤ 0.1 nm[5]
Wavelength Reproducibility (NIR, Deuterium Lamp Lines)—≤ 0.06 nm[5]
Photometric Accuracy (Double Aperture Method 1 A)—± 0.0012 A[5]
Photometric Linearity (at 3.0 A, addition of filters UV/Vis at 546.1 nm, 2 nm Slit, 1-sec integration)—± 0.020 A[5]
Photometric Range—6 A (using reference-beam attenuation)[5]
Bandpass—0.17 nm - 5.00 nm in 0.01 nm increments UV/Vis range; 0.20 nm - 20.00 nm in 0.04 nm increments NIR range[5]
Photometric Stability (after warm-up at 500 nm, 0 A, 2 nm Slit, 2-sec integration, Peak to Peak)—≤ 0.0002 A/h[5]
Baseline Flatness (190 nm - 3100 nm, slit UV/Vis 2 nm, slit NIR Servo Mode)—± 0.0015 A[5]
Photometric Noise RMS (0 A and 500 nm)—≤ 0.00005 A[5]
Primary Sample Compartment (W x D x H)—200 mm x 300 mm x 220 mm[5]
Secondary Sample Compartment (W x D x H)—480 mm x 300 mm x 220 mm[5]
Instrument Dimensions (W x D x H)—1020 mm x 740 mm x 300 mm[5]
Instrument Weight—~ 77 kg[5]
Digital I/O—RS 232 C[5]
Light Beam (above base plate)—90 mm; 120 mm beam separation; 3 mm - 12 mm beam height[5]
Power Requirements—90 VAC - 250 VAC, 50/60 Hz; 400 VA[5]
Temperature Range—10 °C - 35 °C[5]
Recommended Humidity—10 - 70% relative humidity, non-condensing[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]nanoqam.cananoqam.ca
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]inventory listing
  5. [5]nanoqam.cananoqam.ca