Comparison ledger
Mattson Paradigme, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ParadigmeMattson | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Mattson | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Mattson Paradigme | Oxford Instruments 100 ICP Fluorine |
| Cited variants |
| — |
| Specifications | ||
| Manufacturer | Mattson[2] | — |
| Model | Paradigme[2] | — |
| Category | Etch[3] | — |
| Wafer size | 300 mm[1] | 4 inch, 6 inch, 8 inch (with clamp change)[5] |
| Process node | 20-nanometer technology node and below[4] | — |
| Chamber design | two-wafer chamber design[4] | — |
| Plasma source | proprietary plasma source[4] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[5] |
| Cryo DRIE etch rate | — | up to 5 µm/min[5] |
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