Waferpedia

Comparison ledger

1 WBS 1 Wafer SubstrateversusSB 6

Logitech 1 WBS 1 Wafer Substrate, SUSS MicroTec SB 6, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SB 6SUSS MicroTec
OEMLogitechSUSS MicroTec
CategoryPackaging & BondingPackaging & Bonding
Wafer size—Wafer bonding at pressures 5e-5 to 3e-3 Torr and 50*C to 550*C
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLogitech 1 WBS 1 Wafer SubstrateSUSS MicroTec SB 6
Cited variants—
Specifications
Wafer Size6 inch[3]6 inch (150 mm)[4]
Configuration—Pneumatic Block replaced with a SMC Solenoid Block[4]
Wafer size—Wafer bonding at pressures 5e-5 to 3e-3 Torr and 50*C to 550*C[4]
Temperature range—50°C to 550°C[5]
Vacuum pressure—5e-5 to 3e-3 Torr[4]
Base pressure—<5x10^-5 mbar[1]
Process pressure range (source 3)—5e-5 to 3e3 mBar[5]
Maximum force—20 kN[5]
Anodic bonding voltage—up to 2000 V[5]
Temperature accuracy—+/- 5 degrees[5]
Temperature uniformity—+/- 3%[5]
Heating—Upper and lower heating[5]
Control system—Windows-based computer control[5]
Bond head size—150 mm[1]
Substrate sizes supported—100 mm wafers, 3 inch wafers, small pieces[1]
Compatible bonding processes—Adhesive, Anodic, Eutectic, Fusion, Glass frit, Thermal compression[1]
Bonding Pressure Range—5e-5 to 3e-3 Torr[4]
Achievable Chamber Pressure—< 5x10^-5 mbar[1]
Supported Bonding Processes—Adhesive, Anodic, Eutectic, Fusion, Glass frit[1]

Plan your fab

Building a Packaging & Bonding process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]uwaterloo.cauwaterloo.ca
  2. [2]web.archive.orgweb.archive.org
  3. [3]Equipment inventory listing
  4. [4]inventory listing
  5. [5]nanolab.ucla.edunanolab.ucla.edu