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Comparison ledger

EDC-HL-23 BversusWS-750Lz-23B

Laurell EDC-HL-23 B, Laurell WS-750Lz-23B, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMLaurellLaurell
CategoryResist ProcessingResist Processing
Wafer size150mm150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLaurell EDC-HL-23 BLaurell WS-750Lz-23B
Specifications
OEMLaurell[1]—
ModelEDC-HL-23 B[1]—
Model TypeEDC System[1]spin coater[2]
Controller650-series[1]—
Max. Substrate Size150 mm (5" x 5")[1]—
Max. RPM12000 rpm[1]—
Mounting OptionsTabletop, In-Deck, On-deck[1]—
Type—spin coater[2]
Series—750 Series[2]
Max substrate size—ø150mm (5" x 5")[2]
Max RPM—12,000 rpm[2]
Mounting options—Tabletop, In-Deck, On-Deck[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]images.laurell.comimages.laurell.com
  2. [2]laurell.comlaurell.com