Waferpedia

Comparison ledger

EDC-HL-15versusWS-650-23

Laurell EDC-HL-15, Laurell WS-650-23, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
EDC-HL-15Laurell
WS-650-23Laurell
OEMLaurellLaurell
CategorySpin coaterSpin coater
Wafer size300mm150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation650-series—
FamilyLaurell EDC-HL-15Laurell WS-650-23
Cited variants
  • EDC-HL-15 B650-series[1]
  • EDC-HL-23B650-series[1]
  • EDC-HL-8B650-series[1]
Specifications
ModelEDC-HL-15 B[1]WS-650-23 B Spin Coater[2]
Series650-series EDC system[1]—
Wafer/substrate capacityUp to ø 300 mm wafers and 9" × 9" (229 mm × 229 mm) substrates[1]—
Maximum speed capability12,000 RPM with vacuum hold-down[1]—
Recommended speed3,000 RPM[1]—
Recommended chuck typeNon-vacuum chucks[1]—
Power95 to 240 VAC, 47/63 Hz, ~300 Watts[1]95 to 240VAC, 47/63HZ, ~300 Watts[2]
CategorySpin coater[1]—
Wafer capacityUp to 300mm wafers[1]Up to ø 150 mm wafers[2]
Substrate capacity9 in × 9 in (229mm × 229mm) substrates[1]5" × 5" (127 mm × 127 mm) substrates[2]
Mounting—Station Mounted[2]
Maximum rotational speed—12,000 RPM (based on a ø 100 mm silicon wafer)[2]
Required N2 process/seal purge—60–70 PSIG (4–5 bar) of Nitrogen/CDA[2]
Vacuum—25–28 inches Hg; suggested flow volume 4.5 SCFM (0.127 cubic meters/minute) at 0 inches Hg[2]
Processes supported—Coating, Etching, Developing, Rinsing-Drying and Cleaning[2]
Maximum substrate size—150 mm wafers, 5" × 5" (127 mm × 127 mm) substrates[2]
Vacuum requirement—25–28 inches Hg (~635–711 mm Hg) with a flow volume of 4.5 SCFM (0.127 m³/min) at 0 inches Hg[2]
Seal/process purge gas—N₂ at 60–70 PSIG (4–5 bar)[2]
Gas consumption (standard motor)—3 cubic feet per hour (0.085 m³/hour)[2]
Gas consumption (high-performance motor)—20 cubic feet per hour (0.566 m³/hour)[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org