Lam Research
TCP 9600 SE Metal alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Nordson
March AP 1000
Etch
The Nordson March AP 1000 is a plasma system used for etching, operating at 50 Hz with a CB current of 25 A and an SCCR of 10 kA.
Nordson
March AP 300
Etch
The Nordson March AP 300 is a plasma system with a 300 Watt, 13.56 MHz RF generator and an integrated RF automated tuning network assembly.
Oxford Instruments
Plasmalab 100 ICP 380
Etch
The Oxford Plasmalab 100 ICP 380 is an etcher, as stated in the product listing.
Applied Materials
0010 47763
Etch
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
Applied Materials
0010-16392 ESC Assembly
Etch
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Applied Materials
0041-39086 ESC Part
Etch
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