Comparison ledger
Lam Research SEZ 323 Spin, Tegal 1511e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SEZ 323 SpinLam Research | 1511eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | Single wafer | three- to six-inch wafers |
| Process node | — | — |
| Introduced | — | 1984 |
| Production run | — | 1984– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research SEZ | Tegal 1511e |
| Cited variants | — | |
| Specifications | ||
| Configuration | Chambers (2)[4] | — |
| Wafer Sizes | 8, 12 inch[4] | — |
| Chambers | 2[4] | — |
| Wafer sizes | 8 inch, 12 inch[4] | — |
| Number of chambers | 2[4] | — |
| OEM | Lam / SEZ[4] | — |
| Model | 323[4] | — |
| Tool type | Spin Etcher[4] | — |
| Voltage | 400 VAC[2] | — |
| Phase | 3 Phase[2] | — |
| Max. Current | 75 A[2] | — |
| Wafer size | Single wafer[2] | — |
| tool type | — | tri-electrode dual-frequency plasma etch system[5] |
| wafer size | — | three- to six-inch wafers[5] |
| first sold | — | 1984[5] |
| system characteristic | — | first vacuum-loadlocked dual-frequency tri-electrode etch system[5] |
| First vacuum-loadlocked dual-frequency tri-electrode etch system | — | Yes[5] |
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