Waferpedia

Comparison ledger

Rainbow 9600 SE II TCPversus100 ICP Fluorine

Lam Research Rainbow 9600 SE II TCP, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
100 ICP FluorineOxford Instruments
OEMLam ResearchOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research RainbowOxford Instruments 100 ICP Fluorine
Specifications
ConfigurationWith DSQ[1]—
Wafer TypeFlat[1]—
Vlave TypeVAT Pendulum Valve 65 Series[1]—
SMIFNo[1]—
BulkheadWall Facia are Missing[1]—
Monochromator EndpointDual Endpoint Detector - Lam # 853 001983 110[1]—
SoftwareE 2.0.1-044[1]—
RF3X on Board Trumpf Generators (Top, Bias, DSQ)[1]—
CartNo[1]—
Robot TypeHarmonic Drive[1]—
Loader TypeHine Indexers 38 A[1]—
Turbo PumpsAlcatel ATH 1300 MT[1]—
Etch Gases—SF6, CF4, O2, Ar, N2, CHF3, C4F8[2]
Cryo DRIE etch rate—up to 5 µm/min[2]
Wafer size—4 inch, 6 inch, 8 inch (with clamp change)[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nanofab.utah.edunanofab.utah.edu