Comparison ledger
Lam Research AutoEtch 490, Parts, Tegal 1511e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | AutoEtch 490, PartsLam Research | 1511eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | 6-inch capability | three- to six-inch wafers |
| Process node | — | — |
| Introduced | — | 1984 |
| Production run | — | 1984– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research AutoEtch 490, Parts | Tegal 1511e |
| Specifications | ||
| Condition | Parts Machine, Sell it at AS IS ,Where Is term.[1] | — |
| Quantity | 1 set[1] | — |
| Wafer Size | 6-inch capability[1] | — |
| Valid Time | Subject to prior sale[1] | — |
| Lead Time | Ready to go[1] | — |
| Category | Plasma Etch[1] | — |
| Original Equipment Manufacturer | Lam Research[1] | — |
| Warranty | N/A[1] | — |
| Refund | N/A[1] | — |
| Inspection | Against appointment[1] | — |
| OEM | Lam Research[1] | — |
| Model | Lam AutoEtch 490, Parts Machine[1] | — |
| Wafer size capability | 6-inch capability[1] | — |
| System type | in-line, cassette-to-cassette, fully automated, single-wafer, double airlocked, parallel plate plasma etching system[2] | — |
| Chemistries | chlorine and Freon chemistries[3] | — |
| Applications | Polysilicon; Silicon Nitride; Refractory metal silicides; Thin dielectrics[3] | — |
| tool type | — | tri-electrode dual-frequency plasma etch system[4] |
| wafer size | — | three- to six-inch wafers[4] |
| first sold | — | 1984[4] |
| system characteristic | — | first vacuum-loadlocked dual-frequency tri-electrode etch system[4] |
| First vacuum-loadlocked dual-frequency tri-electrode etch system | — | Yes[4] |
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