Comparison ledger
Lam Research 2300 Kiyo GX RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2300 Kiyo GX RIELam Research | 1512eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 2300 | Tegal 1512e |
| Specifications | ||
| Configuration | Poly[1] | — |
| Film Type | Polysilicon[1] | — |
| FOUP Ports | 4[1] | — |
| Turbo Pump | Edwards / STP-iXA3306CV[1] | — |
| Chiller Unit | ATS / MPX-45FN / 6 units[1] | — |
| OEM | Lam[1] | — |
| Model | 2300 Kiyo GX[1] | — |
| Equipment type | Reactive Ion Etcher (RIE)[1] | — |
| Tool type | Reactive Ion Etcher (RIE)[1] | Industrial RIE plasma etcher system[3] |
| Stated configuration | — | With modules assembly for CI-4222[3] |
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